| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2025 | 46 | WO/2025/212137 | METHOD OF FORMING A STITCHED PHOTONIC STRUCTURE | US2024/057688 | G03F 1/20 | PSIQUANTUM, CORP. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/233103 | FIXED PARALLEL ALIGNMENT SENSORS IN COMBINATION WITH FAST SCANNING | EP2025/060602 | G03F 7/20 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/233110 | METROLOGY METHOD AND ASSOCIATED APPARATUS | EP2025/060795 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/233115 | SYSTEMS AND METHODS FOR COMPACT UNIFORMITY CORRECTION MODULE (UNICOM) | EP2025/060951 | G03F 7/20 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/233274 | SYSTEM FOR WRITING, MEASURING, INSPECTING, OR OTHERWISE TREATING OR EVALUATING A PATTERN ON A SUBSTRATE WITH IMPROVED POSITIONING | EP2025/062203 | G03F 7/20 | MYCRONIC AB | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/233871 | ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE | IB2025/054816 | G03F 7/40 | MERCK PATENT GMBH | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234015 | POSITION DETECTION METHOD, POSITION DETECTION SYSTEM, AND EXPOSURE DEVICE | JP2024/017073 | G03F 9/00 | NIKON CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234036 | EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND EXPOSURE DEVICE | JP2024/017175 | G03F 7/20 | NIKON CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234182 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE | JP2025/004397 | G03F 7/36 | TOKYO ELECTRON LIMITED | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234192 | POSITION DETECTION METHOD, POSITION DETECTION SYSTEM, AND EXPOSURE DEVICE | JP2025/005843 | G03F 9/02 | NIKON CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234216 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | JP2025/009886 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234333 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND SEMICONDUCTOR ELEMENT | JP2025/015920 | G03F 7/027 | RESONAC CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234336 | GLASS SUBSTRATE FOR EUV LITHOGRAPHY AND MASK BLANK FOR EUV LITHOGRAPHY | JP2025/015926 | G03F 1/24 | AGC INC. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234364 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND ONIUM SALT COMPOUND | JP2025/016246 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/234401 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JP2025/016536 | G03F 7/004 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/235521 | CONTAINER POD AND RELATED SYSTEMS AND METHODS | US2025/028003 | G03F 1/66 | ENTEGRIS, INC. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/235536 | RETICLE POD | US2025/028023 | G03F 1/66 | ENTEGRIS, INC. | PHYSICS | فیزیک | ابزارها | 2025 | 46 | WO/2025/235539 | MULTI-DEVICE CONTAINERS USEFUL WITH SEMICONDUCTOR PROCESSING DEVICES OF DIFFERENT DIMENSIONS, AND RELATED METHODS | US2025/028027 | G03F 1/66 | ENTEGRIS, INC. | PHYSICS | فیزیک | ابزارها |